Abstract
A feasibility study on soft X-ray reduction lithography using multilayer mirrors has been performed. An exposure wavelength range of 80 to 110 Å is proposed as the most suitable with current technology considering the optic design, the reflectivity of the multilayer, and the resist characteristics. With the aim of providing multilayers with very sharp interfaces and high reflectivity, we attempted to improve the multilayer fabrication process, with one result being the fabrication of an amorphous Mo/Si multilayer, by controlling substrate temperature. Experimental results of 0.2-µm pattern replication using a multilayer reflection mask are presented.
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