Abstract
Bulk iron silicides and implanted iron silicides have been studied by soft-x-ray emission (SXE) spectroscopy. The Si ${\mathit{L}}_{2,3}$ emission spectra of these materials are measured. For bulk silicides, these spectra provide a measure of s- and d-type partial density of states (PDOS) localized on the Si sites. We compare them with available band-structure calculations and also with photoemission measurements. For implanted systems, the Si ${\mathit{L}}_{2,3}$ emission spectra provide useful information about the silicide formation process with the variation of implant doses.
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