Abstract
Nanoimprint technology already demonstrated high resolution capability using hard master stamps in the mid 90's. Considering this as a well known technology, there are still restrictions making nanoimprint lithography (NIL) a competitive "next generation lithography" technique. This paper will address limitations in regard to large area master stamp manufacturing, resolution and lifetime using soft UV-NIL imprint lithography on stamps fabricated by massively parallel ion beam lithography provided by the CHARPAN tool. It provides detailed information of sub- 15 nm (dots, grids and lines) replication processes at master fabrication, working stamp replication and imprinting.
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