Abstract
The development of devices relying on spin phenomena requires of an ideal spin polarized electron source. This can be achieved by taking advantage of half-metallic full Heusler alloy thin films. However, their implementation requires a controlled growth of stoichiometric films with large activation volumes. In this work, we report on the growth of epitaxial Fe3Si ultra-thin films by pulsed laser deposition on SrTiO3(001) substrates, analyzing the effect of deposition temperature in the structural, morphological and magnetic properties of the deposited films. We conclude that optimal compromise between phase purity and interface quality is obtained at 200 ºC, obtaining the best magnetic response under this condition.
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