Abstract
Herein we report on pattern formation of a self-assembled monolayer (SAM) using soft colloidal lithography, based on strong physical contact between microspheres and substrate. In typical colloidal lithography, weak contact of microspheres with the substrate does not block the formation of a SAM. To establish conformal contact between microspheres and substrate to block the formation of a SAM, magnetic force was exerted on softened paramagnetic microspheres that had been swollen by a solvent. The soft colloidal lithography with controlled buoyance enables pattern formation through simple wet chemistry.
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