Abstract
P-type conductivity enhancement of cuprous oxide Cu2O films covered with sodium chloride (NaCl) nano-layer using the reactive annealing method is reported in the present study. Effects of the NaCl nano-layer on the surface morphology, structural characteristics, and electrical properties of the material are discussed. Changes in the surface morphology and chemical composition of Cu2O films produced by the annealing process were studied by scanning electron microscopy and energy dispersive spectroscopy analysis, respectively. The structure of the Cu2O film was studied by x-ray diffraction analysis and Raman spectroscopy. The Raman results demonstrate the reduction of the cupric oxide CuO phase formed above the Cu2O layer by natural progressive oxidation. After performing the reactive annealing process, electrical resistivity decreased from 900 to 90 Ω cm due to the incorporation of sodium into the Cu2O lattice. An increase in carrier mobility was observed with respect to the as-grown Cu2O films, which may be attributed to the decrease in structural defects. A discussion on the stability of Cu2O in comparison to the CuO phase when copper oxide films are covered with a NaCl nano-layer is also provided.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
