Abstract
Atomic force microscopy (AFM) and X-ray diffraction (XRD) have been used to characterize surface structures of Sn thin films grown on SiO 2 glass substrates. The surface morphology of the Sn thin films is found to be strongly dependent on the film thickness and the growth temperature. The 100-nm-thick Sn film grown at 330 K is mainly composed of flat-top islands with a grain size of 400 nm in diameter and shows the preferred orientation of the a-axis perpendicular to the substrate surface.
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