Abstract
X-ray optics based on MEMS technologies can provide future astronomical missions with ultra light-weight and high performance optical systems. A silicon optics was fabricated using dry etching and annealing technologies. An angular resolution evaluated in the X-ray wavelength range was about 20 arcmin in full width half maximum, corresponding to 3.1 mm. In this paper, to achieve a better angular resolution, the silicon dry etching and annealing processes are conditioned. The surface roughness of sidewalls were measured at a 100 µm scale. After the conditionings, it has been improved by a factor of four.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
