Abstract
A simple and reliable method for the formation of smooth and large-scale organometallic complex thin films was developed. We applied chemical vapor deposition (CVD) for this. From the vapor-phase reaction of Mo(CO)6 and 2,2′-bipyridine, large-scale and highly smooth Mo(CO)4(2,2′-bipy) films were obtained. Regardless of the thickness, they show a high smoothness and stability in ambient conditions. Chemical structure and composition of the resulting film were confirmed by 1H-NMR, Raman, FT-IR spectroscopy and elemental analyses. Smooth and uniform surface of the resulting films was characterized using AFM. We believe that our method will provide great opportunities for the fundamental studies of traditional organometallic complexes and their applications by taking advantages of thin film geometry.
Highlights
A simple and reliable method for the formation of smooth and large-scale organometallic complex thin films was developed
organometallic complexes (OMCs) have been synthesized in solution phase, but this method is more appropriate for obtaining three-dimensional structures than for lms
We report a rapid and highly efficient chemical vapor deposition (CVD) method that uses in situ vapor-phase chemical reactions of precursors to synthesize highly-uniform thin lms of OMCs
Summary
A simple and reliable method for the formation of smooth and large-scale organometallic complex thin films was developed. OMCs have been synthesized in solution phase, but this method is more appropriate for obtaining three-dimensional structures than for lms. Development of efficient synthesis methods to obtain large-scale and uniform OMC lm remains a challenge.
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