Smooth, Aggregate-Free Self-Assembled Monolayer Deposition of Silane Coupling Agents on Silicon Dioxide

Abstract

Silane coupling agents (SCAs) are notorious for aggregating during deposition on oxide substrates, leading to nonuniform surface morphologies. To ameliorate this problem, we describe a vapor-phase deposition technique for silane coupling agents employing a spin-coated perfluoropolyether (PFPE) diffusion barrier that facilitates the formation of smooth, aggregate-free self-assembled monolayers (SAMs). Samples fabricated using PFPE barrier layers yielded SAMs exhibiting similar water contact angles, reduced water contact angle hysteresis, and a 2-fold reduction in rms roughness relative to those without a barrier. X-ray photoelectron spectroscopy confirms that the barrier layer can be completely removed after deposition, leaving behind a smooth monolayer. A basic analysis of the agglomerate separation ability of the barrier layers is discussed to understand the critical parameters involved. Generalized guidelines for selecting barrier materials are presented.