Abstract
A WSi2/Si multilayer, with 300 bi-layers and a 2.18-nm d-spacing, is designed for X-ray monochromator application. The multilayer is deposited using direct current magnetron sputtering technology. The reflectivity of the 1st-order Bragg peak measured at E=8.05 keV is 38%, and the angular resolution (\Delta \theta/\theta) is less than 1.0%. Fitting results of the reflectivity curve indicate a layer thickness drift of 1.6%, mainly accounting for the broadening of the Bragg peaks. The layer morphology is further characterized by transmission electron microscopy, and a well-ordered multilayer structure with sharp interfaces is observed from the substrate to the surface. The material combination of WSi2/Si is a promising candidate for the fabrication of a high-resolution multilayer monochromator in the hard X-ray region.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
