Abstract
A new compact electron cyclotron resonance (ECR) plasma source, which is termed slant-slot antenna-type ECR plasma source, is presented. Using this plasma source an ion saturation current density Iis of 6.2 mA/cm2±5.2% was obtained over a diameter of 300 mm under ambient conditions of Cl2 gas at 0.7 Pa. The features of the plasma source are an independent circular TM011 mode cavity resonator and slot antennas mounted in the shape of a ring at a constant slant angle to the surface current flowing at the bottom of the cavity resonator. As the result, microwaves of TE01 mode and others having a ring-shaped the electric field distribution can be introduced into the reaction chamber with high stability. This plasma source can generate a plasma with a ring-shaped Iis distribution stably, and it can control the Iis distribution by means of both the configuration of the magnetic field and the pattern of slot antennas. Therefore, the plasma source can generate a uniform plasma under a wide range of discharge conditions.
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