Size effect in the low-field Hall coefficient of single-crystal copper films

Abstract

Measurements of the low-field Hall coefficientRH of single-crystal copper films were made at 4.2 K by the use of a SQUID. The surface normaln of the samples was directed in the [100], [110], and [111] directions and the ratio of the thickness to the mean free path ranged from 0.1 to 0.7. It is found that the effect of surface scattering causesRH to decrease whenn ‖ [100], whereas it causesRH to increase whenn ‖ [110] and [111]. This behavior is interpreted in terms of the geometrical characteristics of the Fermi surface.