Abstract
The size distribution and crystal morphology of islands in discontinuous silver films, deposited onto amorphous carbon substrates by RF plasma-assisted DC diode sputtering have been investigated by means of digital image processing and high-resolution transmission electron microscopy. The growth mode after the nucleation process was classified into two types of growth stage: one is a liquid-like coalescence stage and the other is a stage of string-like connected individual islands. The two-dimensional projected areas of islands were found to obey a log-normal distribution. The geometrical standard deviation, σ, ranged from 1.6 to 2.2 in the former stage and was much larger in the later stage. The above growth process was quite similar to the case of vacuum evaporation, although a different growth mode was also observed at elevated substrate temperatures.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
