Abstract

The incorporation of 18O isotope labels into specific positions of oxide-supported vanadium complexes has been achieved by grafting VOCl 3 onto silica. The gas phase reaction of VOCl 3 with the hydroxyl groups of the silica surface yields exclusively SiOV(O)Cl 2. When the hydroxyl groups are first exchanged with H 2, 18O, the subsequent reaction with V 16OCl 3 gives uniquely Si 18OV 16OCl 2. Reaction of V 18OCl 3 with unlabelled silica gives only Si 16OV 18OCl 2. Exchange of the chloride ligands with alcohols gives SiOV(O)Cl(OR) and SiOV(O)(OR) 2 sequentially, without displacing or diluting the isotope labels. The thermal and photochemical reactions of SiOV(O)Cl 2 with the substrates ArNCO and CO, respectively, proceed by oxygen transfer uniquely from the terminal oxo position, as shown by the isotope distribution of the CO 2 product formed in each reaction. When the reactions are run under catalytic conditions, below 70°C, no incorporation of the lattice oxygen of silica into CO 2 was observed.

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