Abstract
Interference Lithography (IL) is a powerful and inexpensive tool for large area precision nanoscale patterning of periodic structures. In this work we extend IL's capability to create features in arbitrary shapes and locations through the use of binary contact masks with wavefront division deep-UV interference lithography. Grating couplers for use in a streak measurement system and a focal plane division polarimeter are created to demonstrate the viability and versatility of the technique. Simultaneous fabrication of 90nm and 20μm features proves the potential of this process to simplify and streamline common fabrication processes in research and in industrial applications.
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