Abstract
Fe-Si films have been prepared using a rf-sputtering apparatus, and the magnetic properties have been investigated. It is confirmed that Fe-Si/SiO 2 multilayered films improve the domain configurations and the magnetic properties, such as the initial permeability and the coercivity. These improved multilayered films were assembled as thin and narrow width main poles for single-pole type heads. A thinner main pole gave the higher D 50 and the value of 173 kFRPI was obtained at a film thickness of 75 nm. Also, reproduce sensitivity increases with decreasing track width, while the reproduced waveform and recording sensitivity were independent of the track width.
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