Abstract
Rib waveguides were fabricated with the use of selective, wet chemical etching of two-component waveguide films SiO2:TiO2 which were obtained using sol–gel method. Photoresist was applied as a mask in the process. The etching of the films SiO2:TiO2 was carried out in water solution of ammonia fluoride. The paper presents the results of theoretical analysis as well as the power distributions in the fabricated strip waveguides.
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