Abstract
Heavy-ion-induced single-event measurements for p-channel InGaSb quantum-well metal-on-insulator field-effect transistors (QW-MOSFETs) are demonstrated for a range of gate bias conditions. Two p-channel In0.33Ga0.67Sb QW structures were evaluated– a buried channel structure and a surface channel structure with and without an Al0.8In0.2Sb barrier layer respectively. The heavy-ion induced transient response is investigated for both structures. A slowly relaxing transient decay is observed in the buried channel device which is responsible for the bulk of the charge enhancement. It is effectively eliminated with the removal of the Al0.8In0.2Sb barrier, leading to a $10\times $ reduction in collected charge in the surface channel device. To analyze the transient response, a calibrated TCAD device simulation equipped with a heavy ion induced ionization model has been developed, which shows excellent agreement with the measured results for the entire range of evaluated gate bias conditions. The simulation analysis reveals that the charge collection enhancement phenomenon in a p-channel InGaSb QW-MOSFET is associated with the increased bipolar gain due to electron trapping in the Al0.8In0.2Sb barrier.
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