Abstract
A split gate technique is used to form a lateral quantum dot in a two-dimensional electron gas of a modulation-doped silicon/silicon–germanium heterostructure. e-beam lithography was employed to produce split gates. By applying negative voltages to these gates the underlying electron gas is depleted and a lateral quantum dot is formed, the size of which can be adjusted by the gate voltage. We observe single-electron operation with Coulomb blockade behavior below 1 K. Gate leakage currents are well controlled, indicating that the recently encountered problems with Schottky gates for this type of application are not an inherent limitation of modulation-doped Si/SiGe heterostructures, as had been speculated.
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