Abstract
Static sputter processes for the mass production of multilayer systems used as magneto-optical recording media require discontinuous operation of circular magnetron cathodes in nonreactive and reactive gas atmospheres. Sputter sources based on rotating magnet sets have been developed which meet high uniformity requirements for optical and magnetic properties of the individual layers even with an inner and outer diameter substrate masking integrated to the cathode station. In a first step, process development was focussed on the production of 5.25" disks in a very compact single disk 'circular path coater' realizing a throughput of 180 disks/hour. As a second step, the cathode design has been modified for the production of 3.5" media in the same machine. In this paper the design of the cathode is described, and experimental results of the process development for SiNx and TbFeCo thin films are presented.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
