Abstract
Single-crystalline GePb alloys have been successfully achieved by implanting Pb into Ge, followed by rapid thermal annealing under N2 atmosphere. The high crystallinity and the thickness of around 20 nm of the GePb alloys was determined by high-resolution x-ray diffraction and high-resolution transmission electron microscopy. The root-mean-square value of the as-implanted GePb sample is evaluated to be 1.25 nm in the 5 × 5 um scan area, which indicates a rather smooth surface. After being annealed at 400 °C, the result of a selected area electron diffraction pattern suggested that a single-crystalline alloy film was formed for the first time. The Pb composition of this sample is approximately 0.23% according to the x-ray photoelectron spectroscopy results. This value corresponds with the measurement result of the secondary ion mass spectroscopy. In addition, mobility enhancement in GePb/Ge samples has been identified by temperature-dependent Hall measurement, which indicates GePb alloys have great potential to be a promising high-mobility channel material for future monolithic optoelectronics integration application.
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