Single crystal-like Si patterns for photonic crystal color filters

Abstract

A novel fabrication method for a two-dimensional photonic crystal color filter based onguided mode resonance is proposed. An amorphous silicon layer deposited through thelow-temperature plasma enhanced chemical vapor deposition (PECVD) process ispatterned into two-dimensional structures using low-cost nanoimprint lithography. It isthen effectively crystallized using multi-shot excimer laser annealing at low energy. We havedemonstrated analytically and experimentally that single crystal-like silicon patterns on aglass substrate can offer high-efficiency photonic crystal color filters for reflective displayapplications. The highly crystallized silicon patterning scheme presented here may be veryattractive for a variety of devices requiring high carrier mobility and high optical efficiency.