Abstract
Plasmonic crystals (e.g., metallic nanohole arrays and metallic nanoparticle arrays) are widely used in the field of nanophotonics due to their effects on light confinement. Soft nanoimprint lithography is a promising technology for large-scale production of high-quality plasmonic crystals in industry. However, this technology suffers from a high cost of the solid mold with a limited pattern for lithography. In order to reduce the cost, we develop an approach to simultaneous fabrication of both a plasmonic nanohole array and a plasmonic nanoparticle array by only using one solid mold. They show good morphological uniformity, and demonstrate high efficiencies of light trapping in the visible range and the infrared range, respectively. In combination with electromagnetic simulation, we can preliminarily design the expensive mold and guide the production of plasmonic crystals more efficiently.
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