Abstract

Sputtering erosion and impurity deposition on C and W surfaces irradiated with D + plasmas containing C 4+ impurity have been studied. For the C target, the net erosion is suppressed by the local redeposition resulting from charge exchange reactions of chemically sputtered CD x with D + at the high plasma density and low plasma temperature. The D/XB values for CD 4 reaction chains with electrons plus deuterium ions are lower than those for CD 4 reaction chains with electrons at the low temperature. At the high temperature, these D/XB values which reproduce the experimental data are almost the same. For the W target, in association with the C 4+ impurity concentration, the erosion and deposition occur near to and far from the LCFS, respectively, which qualitatively reproduces the experimental data. The erosion and deposition fluctuate depending on the target temperature. The fluctuation is explained by an interrelation between the diffusion and the reflective scattering collision.

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