Abstract
We have studied the performance potential of an 80 nm physical gate length MOSFET with GaAs channel and high-k gate insulator using ensemble Monte Carlo simulations. The results show that a such device could deliver a 100–125% increase in the drive current compared to conventional MOSFETs with analogous channel lengths and device structure. This improvement is much higher than the 20–30% drive current increase in similar devices with strained Si channels on virtual SiGe substrates.
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