Simulation of x-Ray Diffraction of Multilayer Film with Interfacial Roughness

Abstract

In this paper, the x-ray diffraction profiles of multilayer with uncorrelated rough interfaces are directly simulated using kinematic theory of x-ray diffraction. The result shows that the decrease of the reflective intensity caused by the interfacial roughness is more severe than that caused by random fluctuation of period of the same degree, and the decrease of the reflective intensity of high order Bragg deffraction is more rapid than that of low order ones. So it is very important to reduce the interfacial roughness in the deposition and in the annealing of multilayer films.