Abstract

By using two-dimensional numerical simulation, the ratio between the effects of wakefield focusing and selffocusing during the propagation of a short sequence of electron bunches in plasma has been simulated. Cases of dominant wakefield focusing have been demonstrated. In addition, the collection data is presented on the parameters of the bunch length, shape and distance between bunches correspond to certain ratios of wakefield focusing and selffocusing that can be used in further studies.

Full Text
Paper version not known

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.