Simple process for 60 nm patterned nickel stamp replication

Abstract

A simple process for nickel nanoimprint stamp replication is proposed. Based on this process, the replication of a 15 × 20 mm nickel nanoimprint stamp with 60 nm grating structures was carried out. First, the nanograting structures on the master silicon stamp were transferred to a polymer substrate using the hot embossing process; then, a layer of nickel was sputtered to fill the nanostructures on the substrate surface and form the seed layer for the electroforming process; finally, the back plane of the replica is electroformed. The observation results show good correlation between the dimensions of the master stamp's features and the corresponding replicated features. The performance test result of the replicated stamp demonstrated that the mechanical strength of the replica is sufficient for the hot embossing process.