Abstract
In this work, silver oxide AgO films were prepared and deposited on glass substrates using RF reactive magnetron sputtering technique at different sputtering powers (100, 150 and 200) W. The X-Ray diffraction measurements showed that the prepared films are polycrystalline. It was found that the crystalline size and roughness of the surface, in addition the optical energy gap It has decreased with the increasing sputter power. One of the important results is the development of sensitivity with crystallization, where it was the best sensitivity at operating temperature 100 °C of the sample deposited at 200 W and at the concentration of target gas 600 ppm.
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