Abstract

We investigated the effect of exogenously applied silicon (Si) on the growth and physiological attributes of wheat grown under sodium chloride salinity stress in two independent experiments. In the first experiment, two wheat genotypes SARC-3 (salt tolerant) and Auqab 2000 (salt sensitive) were grown in nutrient solution containing 0 and 100 mM sodium chloride supplemented with 2 mM Si or not. Salinity stress substantially reduced shoot and root dry matter in both genotypes; nonetheless, reduction in shoot dry weight was (2.6-fold) lower in SARC-3 than in Auqab 2000 (5-fold). Application of Si increased shoot and root dry weight and plant water contents in both normal and saline conditions. Shoot Na+ and Na+:K+ ratio also decreased with Si application under stress conditions. In the second experiment, both genotypes were grown in normal nutrient solution with and without 2 mM Si. After 12 days, seedlings were transferred to 1-l plastic pots and 150 mM sodium chloride salinity stress was imposed for 10 days to all pots. Shoot growth, chlorophyll content and membrane permeability were improved by Si application. Improved growth of salt-stressed wheat by Si application was mainly attributed to improved plant water contents in shoots, chlorophyll content, decreased Na+ and increased K+ concentrations in shoots as well as maintained membrane permeability.

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