Silicone grating fabricated using photoresist mold

Abstract

We fabricated a transmission silicone grating using two-beam interference method and imprint lithography, and evaluated its optical characteristics during a compression process. The grating pattern with ~0.4 μm depth and 1 μm pitch was created on a silicone surface by imprinting process with a photoresist mold to realize a simple, low-cost fabrication process. The first order diffraction transmittance of this grating reached ~10% at 633 nm wavelength. We also measured the relationship between the grating period and compressive stress to the fabricated elements. The grating period changed from 1 μm to ~0.8 μm by ~17% compression of the fabricated element in one direction, perpendicular to the grooves.