Abstract
Laser induced thermal desorption (LITD) has emerged as a powerful time-dependent probe of surface processes. The ability of LITD to desorb silicon-containing species from Si(l1l)7x7 has been employed to study the decomposition of H<sub>2</sub>0 and NH<sub>3</sub> on Si(l11)7x7. These LITD studies on Si(111)7x7 assumed that the silicon-containing species were derived from surface reaction intermediates. This assumption was recently tested by transmission FTIR investigations of H20 and NH<sub>3</sub> decomposition on high surface area porous silicon surfaces. The LITD and FTIR results were compared for the thermal stability of the SiOH surface species during H<sub>2</sub>O decomposition and the SiNH<sub>2</sub> surface species during NH<sub>3</sub> decomposition. The good agreement between the LITD and the FTIR investigations indicated that the silicon containing LITD species correspond to silicon surface reaction intermediates.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
