Abstract

In 2020, silicon – molecule – silicon junctions were fabricated and shown to be on average one third as conductive as traditional junctions made using gold electrodes, but in some instances to be even more conductive, and significantly 3 times more extendable and 5 times more mechanically stable. Herein, calculations are performed of single-molecule junction structure and conductivity pertaining to blinking and scanning-tunnelling-microscopy (STM) break junction (STMBJ) experiments performed using chemisorbed 1,6-hexanedithiol linkers. Some strikingly different characteristics are found compared to analogous junctions formed using the metals which, to date, have dominated the field of molecular electronics. In the STMBJ experiment, following retraction of the STM tip after collision with the substrate, unterminated silicon surface dangling bonds are predicted to remain after reaction of the fresh tips with the dithiol solute. These dangling bonds occupy the silicon band gap and are predicted to facilitate extraordinary single-molecule conductivity. Enhanced junction extendibility is attributed to junction flexibility and the translation of adsorbed molecules between silicon dangling bonds. The calculations investigate a range of junction atomic-structural models using density-functional-theory (DFT) calculations of structure, often explored at 300 K using molecular dynamics (MD) simulations. These are aided by DFT calculations of barriers for passivation reactions of the dangling bonds. Thermally averaged conductivities are then evaluated using non-equilibrium Green's function (NEGF) methods. Countless applications through electronics, nanotechnology, photonics, and sensing are envisaged for this technology.

Highlights

  • Synthetic techniques compatible with technologies used in silicon fabrication plants were developed that can assemble molecules with either thiol[1] or disulfide[2] terminating groups between two silicon-electrode contacts

  • Between them are three bands each attributable to two carbons. This electronic structure can interact with the valence band of the silicon and portrays a significant conduction pathway that is close to the Fermi energy, supporting hole conductivity in the P-doped junction

  • Our nonequilibrium Green’s function (NEGF) calculations predict a ratio of 10:1 for the conductance in phosphorous (N-type) and boron (P-type) silicon compared to N-type

Read more

Summary

Introduction

Synthetic techniques compatible with technologies used in silicon fabrication plants were developed that can assemble molecules with either thiol[1] or disulfide[2] terminating groups between two silicon-electrode contacts. This can, in principle, pave the way for the inclusion of singlemolecules, or else nanoscopic self-assembled monolayers (SAMs), to be imbedded into silicon diodes and transistors. International Centre for Quantum and Molecular Structures and School of Physics, Shanghai University, Shanghai 200444, China b.School of Mathematical and Physical Sciences, University of Technology Sydney, NSW 2007 Australia c.

Methods
Results
Conclusion
Full Text
Published version (Free)

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call