Abstract
The formation and heating of laser plasma under the irradiation of silicon in ambient air by pulsed laser radiation with wavelengths of 355 and 532 nm at radiation power density up to 5 GW/cm2 has been experimentally investigated. An increased efficiency of the formation and heating of ablation plasma under bichromatic
 irradiation of silicon with advanced action of nanosecond pulses with a wavelength of 355 nm has been established.
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