Abstract
Si2N2O ceramics were prepared by plasma activated sintering using nanosized amorphous Si3N4 powder without sintering additives within a temperature range of 1400°C–1600°C in vacuum. A mixed Si–N4−n–On (n = 0, 1…4) amorphous structure was formed in the process of sintering, and Si2N2O crystals were nucleated where the local structure was similar with Si2N2O. After sintering at 1600°C, the Si2N2O ceramic was composed of elongated plate‐like Si2N2O grains and amorphous phase. The Si2N2O grains showed a width of less than 100 nm and a very high aspect ratio.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
