Abstract
The first evidence of SiO2 dissolution process in oligo-fluoro-hydrogenate [EMIm(HF)2.3F] room temperature ionic liquid (RTIL) is reported here. Based on the electrochemical measurements, the etch rate of SiO2 in this specific ionic liquid media was found to be lower by an order of magnitude than the measured rate in similar solution volumes of aqueous HF. NMR and FTIR spectroscopies enabled to determine the dissolution mechanism of SiO2 in the oligo-fluoro-hydrogenate ionic liquid. Confirmation of the formation of both water and SiF62− as the reaction products was established. Moreover, the presence of water influences the anionic ratio in the ionic liquid.
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