Abstract
The distribution of nitrogen in plasma deposited silicon nitride films and in commercially produced, hot-pressed bulk material has been determined by the nuclear (proton) track image analysis technique. The nuclear track technique is shown to have the unique capability of sampling large areas (cm2) while providing distribution information on the micro scale (100 μm2). Nitrogen over the range of 2 to 40% is determined quantitatively. Spatial distribution and topographical maps are plotted. The overall composition of the material is established by 14 MeV NAA through the determinations of silicon, nitrogen, and oxygen. An application in the micro electronic industry is described.
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