Abstract
The effect of thermal processing at 1050 °C of a dispersed film of carbon nanoparticles deposited on a Si substrate with a native SiO 2 layer has been studied by scanning electron microscopy and scanning photoelectron spectromicroscopy. It has been found that the thermal processing results in formation of pyramidal-shaped defects of 2–7 μm with strongly reduced SiO 2 content with silicon wires of diameter ranging between 30 and 50 nm decorating the pyramid walls. The nucleation of the Si nanowires occurs via reduction of the native oxide layer by the nanosized carbon particles, without the need of metal catalysts and at temperatures relatively lower than that used in similar techniques.
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