Abstract
AbstractSilane is reacted with active hydrogen in a flow reactor. Thin silicon films are produced which are amorphous or μ‐cristalline, depending only on flow conditions. Growth rates of the films are between 3 and 6 Å/s. The transition from μ‐cristalline to amorphous behaviour is continuous. Treating the material with atomic hydrogen results in a substantial change of the film properties. Etching of the material is also observed and found different for μc‐Si: H compared to a‐Si:H.
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