Abstract
High intensity nanosecond laser pulses of different wavelengths are used to remove thin film silicon dioxide coatings from the silicon surface. Films as thick as 0.7 μm can be removed from the surface in one shot with very minor or no damage to the bare silicon surface. The accumulated effect of multiple-pulse irradiation is studied. It is found that multiple-pulse irradiation results in some reduction of the threshold for coating removal. However, the surface quality gets significantly worse with the increasing number of shots.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
