Abstract
This paper describes a method for the preparation of complex structured waveguides that can be used for millimeter-wave antennas based on a bulk silicon MEMS process. In this paper, a millimeter-wave band array of ridge waveguide slit antennas with multilayer step-matched feeds is realized by this method. A bulk silicon MEMS process is used to realize the complex structure and the high precision and flatness requirements on the millimeter scale, which cannot be achieved by machining. And the step height difference of more than 100um is realized by combining multiple lithography and silicon oxide mask. The step difference is larger than that achievable by dry etching using the etching selection ratio of silicon oxide and silicon. The waveguide fabricated by this method can work well in the millimeter wave band and is used for antenna feeding, power distribution, etc. It is characterized by compact structure, high precision, and high performance.
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