Abstract
Nitrophenols can be obtained in moderate to high yields via nitrosation-oxidation of phenols with silica sulfuric acid, NaNO2 and wet SiO2 at room temperature. In situ generation of HNO2 and a radical cation mechanism via the nitrous acid catalyzed (NAC) pathway appear to be applicable to phenol nitration using these reagents.
Highlights
In several industrially important processes a large excess of sulfuric acid is required because the water by-product slows the reaction down by diluting the acid
In continuation of our studies on the application of inorganic acidic salts we found that silica gel reacts with chlorosulfonic acid to give silica sulfuric acid (I)
We were interested in using this inorganic acidic resin (I) as a new sulfuric acid function immobilized on the surface of silica gel via covalent bonding for the insitu generation of HNO2 when used in conjunction with NaNO2, wet SiO2
Summary
In several industrially important processes (e.g. nitration, nitrosation, etc.) a large excess of sulfuric acid is required because the water by-product slows the reaction down by diluting the acid. We were interested in using this inorganic acidic resin (I) as a new sulfuric acid function immobilized on the surface of silica gel via covalent bonding for the insitu generation of HNO2 when used in conjunction with NaNO2, wet SiO2.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.