Silanization of Low-Temperature-Plasma Synthesized Silicon Quantum Dots for Production of a Tunable, Stable, Colloidal Solution

Abstract

We present a method for grafting silanes onto low-temperature-plasma synthesized silicon quantum dots. The resulting solution of dots is characterized with Fourier transform infrared spectroscopy and transmission electron microscopy, and determined to be a colloidal suspension. The silane is attached at a single point on the quantum dot surface to avoid cross-linking and multilayer formation, and photoluminescence spectroscopy shows the colloidal suspension of dots is stable for over two months in air. The hydroxyl-terminated surfaces required for silanization are created by wet chemical etch, which can be used to tune the luminescence of the silicon dots in the green- to red-wavelength range. We find, however, that the wet etch cannot move the emission into the blue-wavelength range and discuss this observation in terms of the nature of etching process and origin of the emission. In addition, we discuss the photoluminescence quantum yield in the context of other passivation and synthetic techniques.