Abstract
The aim of this paper is to show the possibility to synthesize silicon-based deposits on a polypropylene substrate, using a glow dielectric barrier discharge at atmospheric pressure, and to correlate the gas phase behavior with the properties of the thin film deposits. The discharge is generated in a mixture of nitrous oxide and silane, diluted in nitrogen. The influence of the [N2O]/[SiH4] ratio on the layer characteristics is mainly studied. Deposits are analyzed by XPS, SSIMS, AFM and wetting angle measurements. The discharges are also characterized by their optical emission spectra. Measurements are made as a function of the distance from the gas inlet, and they allow one to correlate these spectra with the film thickness and its chemical composition. Finally, chemical kinetics of the reactive gas decomposition reactions are proposed.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
