Abstract
A significant roughness improvement correlated with a flower-like grain morphology is realized for FTO thin films by inclusion of HNO3 into the deposition system, whilst maintaining high transparency and conductivity.
Full Text 
Sign-in/Register to access full text options
Sign-in/Register to access full text options 
Published version (
Free)
Free) 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
