Abstract
Stylus surface profiler has been widely used in order to measure Young’s modulus of silicon nitride (Si3N4) from microcantilever beams. Until now, several Si3N4 Young’s modulus values have been reported. It may be due to incomplete assessment of the microcantilever beams bending over its entire length or a lack of calibration of the stylus force system used in those works. We presented in this work an alternative method to measure the elastic modulus of MEMS thin layers in a rather accurate manner. A stylus force calibration is reported from a calibrated silicon microcantilever beam in order to measure the Si3N4 Young’s modulus. We reported Si3N4 Young´s modulus from three microcantilever beams, with values of 219.4 ± 0.6 GPa, 230.1 ± 3.4 GPa and 222 ± 11 GPa for 50 µm, 100 µm and 200 µm wide respectively, which are in good agreement with respect to the Si3N4 Young´s modulus which have been determined by other methods.
Highlights
Similar techniques involve pulling down a cantilever beam by means of an electrostatic or mechanical force, which canThe proper design of structures and reliability of the be applied using an optical interferometry [5] or contact microelectromechanical systems (MEMS) rely on the profiler [6] respectively
It is not possible to assume that the profiler in order to determine de Youngs modulus of a mechanical properties measured from a bulk specimen of a silicon nitride and polycrystalline silicon bridges [8]
An alternative method to measure the elastic modulus for different materials in a rather accurate manner was presented
Summary
Qro., 76125, México (Received: October 10th, 2016; Accepted: March 21st, 2017). Stylus surface profiler has been widely used in order to measure Young’s modulus of silicon nitride (Si3N4) from microcantilever beams. Several Si3N4 Young’s modulus values have been reported. It may be due to incomplete assessment of the microcantilever beams bending over its entire length or a lack of calibration of the stylus force system used in those works. A stylus force calibration is reported from a calibrated silicon microcantilever beam in order to measure the Si3N4 Young’s modulus. We reported Si3N4 Youngs modulus from three microcantilever beams, with values of 219.4 ± 0.6 GPa, 230.1 ± 3.4 GPa and 222 ± 11 GPa for 50 μm, 100 μm and 200 μm wide respectively, which are in good agreement with respect to the Si3N4 Youngs modulus which have been determined by other methods
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