Si-ion implantation effects on the surface hardness and microstructure of brass alloy

Abstract

Innovation in materials science is important to provide society with new developments and help engineers deliver more reliable products that are also cost-effective. Brass has a vast range of its applications, while its single-phase structure (α-brass) is more flexible towards modification under ion dose. In this study, the α-brass (64%Cu; 36%Zn) was ion-implanted by 500 keV energy Si-ions, whereas four different doses were used with the main aim of reforming its structural, surface morphological and mechanical properties. SEM analysis revealed that defects were created on the implanted surface in the form of pits, pores, cavities and craters. An obvious decrease occurs in crystallite size and was found dropped from 44.351 to 24.908 nm. The intensity ratio for the plane (2 2 0) was found to be decreased after Si-ion implantation. Whereas for the planes (1 1 1), (2 0 0) and (3 1 1) fluctuating behavior was noted. Hardness of the surface was found higher after Si-ion implantation due to induced defects on the surface. Overall, the Si-ions distorted the surface, induced the strain, reduced the crystalline behavior of brass and improved the hardness.