Abstract
The 3D islands of the Stranski–Krastanow system Ge/Si(001) that form either during the annealing of previously flat and nearly strain-relieved Ge films at 1020 K or directly at the Ge deposition at 1020 K are found to be composed of a mixture of Ge and Si, thus pointing to considerable interdiffusion at 1020 K. Direct measurement of the elastic energy unambiguously reveals that neither the 3D islanding nor the Si in-diffusion are driven by the reduction of misfit strain; this strain being the result of increasing configurational entropy.
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