Si/Ge nanostructures for optoelectronics applications

Abstract

The optical and structural properties of multilayer Si/Ge structures with precritical, as well as close-to-critical, germanium inclusions in a silicon matrix, for which the transition from the two-dimensional to island growth occurs, were studied. The possibility of obtaining intense photoluminescence at room temperature in both cases under optimally chosen growth parameters is demonstrated. The proposed approaches to producing an active region appear promising for applications in silicon-based optoelectronics.